NSTL国家科技图书文献中心

1. 2D Analysis and simulation of quartz crystal etch penetration by revisiting a previous geometric method NSTL国家科技图书文献中心

Zhao X. | Zhao M.... - 《Sensors and Actuators, A. Physical》 - 2024,372 - 共5页

摘要： theoretical model, we develop a CAD-like quartz crystal etch | © 2024This paper presents a quartz* wet etching* | formation of 2D etch profiles and optimize wafer etch | simulator that allows for simulations of various quartz | cut types and etch* penetration. To validate the*

关键词： Anisotropic etch | Etch penetration | MEMS | Quartz

2. Manufacturing of 2D/3D features on NIL Masters NSTL国家科技图书文献中心

H. Rolff | M. Sczyrba ... - 《39th European Mask and Lithography Conference (EMLC 2024): 17-19 June 2024.Grenoble, France》 - European Mask and Lithography Conference - 2024, - 1327312.1～1327312.10 - 共10页

摘要： this paper we will show the variety of Quartz etch | Quartz in combination with a tilt of the substrate. We | with a non-linear variation of etch* depth throughout* | Nano-imprint lithography (NIL) has proven to | be a powerful and cost-efficient technology for

关键词： Nano-imprint lithography | imprint master | quartz etch technologies | slanted waveguides | 3D patterns

3. 3-dimensional, High-Resolution Patterning of Quartz Mask Substrates NSTL国家科技图书文献中心

Christian Burgel | Martin Sczyrba ... - 《Photomask Technology 2024》 - Photomask Technology (conference) - 2024, - 共12页

摘要：. Mask quartz* substrates are an ideal material for both* | Quartz etches can generate 3D topographies in glass | -mixing gratings of different etch* depths, meta-atoms* | In recent years, new technologies in applied | optics and photonics have emerged, which go beyond the

关键词： EBeam | Quartz etch | Mask process | Nano-imprint | Augmented reality | Meta-lenses

4. Dynamic process of wet etching using BOE solutions to control the etch rate, roughness, and surface morphology of a Z-cut α-quartz wafer NSTL国家科技图书文献中心

Xue H. | Zhang Z.... - 《Ceramics International》 - 2024,50(14) - 25978～25987 - 共10页

摘要：Quartz is a widely used material in the field | indicators. Subsequently, the corresponding etch* rate* | acid in the BOE solution results in lower etch* rate* | of the etch* rate, whereas the surface morphology* | wet etching process of the z-cut α-quartz* wafer*

关键词： MEMS | Morphology | Quartz | Roughness | Wet etching

5. Effect of YF 3 on fluorocarbon plasma resistance of Y 2 O 3 -Al 2 O 3 -B 2 O 3 glasses NSTL国家科技图书文献中心

Kim, Yeonju | Kim, Jisu ... - 《Ceramics International》 - 2024,50(18 Pt.A) - 32225～32232 - 共8页

摘要： resistance is evaluated by the etch* rate, surface roughness* | resistance than the reference material, quartz. As the | amount of Y2O3 increased, the etch* rate decreased, and* | plasma resistance by an etch* rate of 22.17 nm/min.* | In this study, alumino-borate glass was

关键词： Plasma corrosion | Plasma resistance | Fluorocarbon plasma | Glass | YF2 | FLUORINE | Y2O3 | BEHAVIOR | AL2O3 | OXIDE

6. Quartz grain microtextures of Holocene sebkhas sediments in southeast Tunisia: Implications for sedimentary processes and depositional environments NSTL国家科技图书文献中心

Ben Ameur M. | Omar H.... - 《Journal of African earth sciences》 - 2024,217(Sep.) - 1.1～1.14 - 共14页

摘要：? 2024 Elsevier LtdDetrital quartz* grains* | its quartz* grains. The aeolian facies sediments are* | characterized by quartz* grains with rounded outlines, upturned* | quartz grains featuring subangular outlines, v-shaped | the quartz* grains of the sebkhas suggest multiple*

关键词： Microtextures | Quartz grain | Salt weathering | Sebkha | Sedimentary processes | Southeast Tunisia

7. Limiting or Continuous Thermal Etching of First Row Transition Metal Oxides Using Acetylacetone and Ozone NSTL国家科技图书文献中心

Partridge, Jonathan ... | Abdulagatov, Aziz I.... - 《Chemistry of Materials: A Publication of the American Chemistry Society》 - 2024,36(15) - 7151～7161 - 共11页

摘要：) x etch* products in the gas phase observed by in* | intensities for the M(acac) x etch* products during five* | etch products resulting from the O-3 exposure. Sc2O3 | etch products with the same oxidation state as the | including V2O5, Mn2O3 , and Co3O4 displayed M(acac) x etch

关键词： 1,1,1,5,5,5-HEXAFLUORO-2,4-PENTANEDIONE H(+)HFAC | HYDROGEN-FLUORIDE | COPPER | OXIDATION | FLUORINATION | MECHANISM | AL2O3 | VAPOR | ZNO | TRIMETHYLALUMINUM

8. Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition NSTL国家科技图书文献中心

Partridge, Jonathan ... | Murdzek, Jessica A.... - 《Chemistry of Materials: A Publication of the American Chemistry Society》 - 2024,36(10) - 5149～5159 - 共11页 - 被引量：1

摘要： (PEt3) to yield a volatile gold etch product. Quartz | 175 degrees C. The most consistent etch* rate was* | yielded a volatile etch* product. In situ quadrupole mass* | -containing etch* product during PEt3 exposures. Time* | ab inito calculations support these etch* product*

关键词： SELF-LIMITING FLUORINATION | HYDROGEN-FLUORIDE | CONVERSION | OXIDATION | AL2O3 | DEPOSITION | TRIMETHYLALUMINUM | SPECTRA | CCSD | ZNO

9. Quartz grain surface features and mineralogy of sediments in the Sundarbans Forest site, Bangladesh: Constraints on the depositional environment and provenance NSTL国家科技图书文献中心

H. M. Zakir,Hossain | Md. Aminul,Islam ... - 《Arabian journal of geosciences》 - 2024,17(12) - 共13页

摘要：-grained quartz* grains (QG) recovered from a ~ 100-m* | , and oriented etch* pits are common in the QG* | is a high abundance of quartz* (Si), feldspar (Na* | Abstract An investigation on medium to coarse | drilled core section of the Sundarbans Forest site in

关键词： Microtexture | Quartz grain | SEM | Sundarbans forest site | SW Bangladesh | Surface features

10. Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions NSTL国家科技图书文献中心

Nam, Taewook | Colleran, Troy A.... - 《Chemistry of Materials: A Publication of the American Chemistry Society》 - 2024,36(3) - 1449～1458 - 共10页 - 被引量：1

摘要： situ quartz* crystal microbalance (QCM) studies were* | the diffusion-limited oxidation of Mo. The Mo etch | . Under saturation conditions, the Mo etch* rates were* | ) did not etch* Mo at 250 degrees C. Time-resolved QMS* | Thermal atomic layer etching (ALE) of

摘要： theoretical model, we develop a CAD-like quartz crystal etch | © 2024This paper presents a quartz* wet etching* | formation of 2D etch profiles and optimize wafer etch | simulator that allows for simulations of various quartz | cut types and etch* penetration. To validate the*

关键词： Anisotropic etch | Etch penetration | MEMS | Quartz

摘要： this paper we will show the variety of Quartz etch | Quartz in combination with a tilt of the substrate. We | with a non-linear variation of etch* depth throughout* | Nano-imprint lithography (NIL) has proven to | be a powerful and cost-efficient technology for

关键词： Nano-imprint lithography | imprint master | quartz etch technologies | slanted waveguides | 3D patterns

摘要：. Mask quartz* substrates are an ideal material for both* | Quartz etches can generate 3D topographies in glass | -mixing gratings of different etch* depths, meta-atoms* | In recent years, new technologies in applied | optics and photonics have emerged, which go beyond the

关键词： EBeam | Quartz etch | Mask process | Nano-imprint | Augmented reality | Meta-lenses

摘要：Quartz is a widely used material in the field | indicators. Subsequently, the corresponding etch* rate* | acid in the BOE solution results in lower etch* rate* | of the etch* rate, whereas the surface morphology* | wet etching process of the z-cut α-quartz* wafer*

关键词： MEMS | Morphology | Quartz | Roughness | Wet etching

摘要： resistance is evaluated by the etch* rate, surface roughness* | resistance than the reference material, quartz. As the | amount of Y2O3 increased, the etch* rate decreased, and* | plasma resistance by an etch* rate of 22.17 nm/min.* | In this study, alumino-borate glass was

关键词： Plasma corrosion | Plasma resistance | Fluorocarbon plasma | Glass | YF2 | FLUORINE | Y2O3 | BEHAVIOR | AL2O3 | OXIDE

摘要：? 2024 Elsevier LtdDetrital quartz* grains* | its quartz* grains. The aeolian facies sediments are* | characterized by quartz* grains with rounded outlines, upturned* | quartz grains featuring subangular outlines, v-shaped | the quartz* grains of the sebkhas suggest multiple*

关键词： Microtextures | Quartz grain | Salt weathering | Sebkha | Sedimentary processes | Southeast Tunisia

摘要：) x etch* products in the gas phase observed by in* | intensities for the M(acac) x etch* products during five* | etch products resulting from the O-3 exposure. Sc2O3 | etch products with the same oxidation state as the | including V2O5, Mn2O3 , and Co3O4 displayed M(acac) x etch

关键词： 1,1,1,5,5,5-HEXAFLUORO-2,4-PENTANEDIONE H(+)HFAC | HYDROGEN-FLUORIDE | COPPER | OXIDATION | FLUORINATION | MECHANISM | AL2O3 | VAPOR | ZNO | TRIMETHYLALUMINUM

摘要： (PEt3) to yield a volatile gold etch product. Quartz | 175 degrees C. The most consistent etch* rate was* | yielded a volatile etch* product. In situ quadrupole mass* | -containing etch* product during PEt3 exposures. Time* | ab inito calculations support these etch* product*

关键词： SELF-LIMITING FLUORINATION | HYDROGEN-FLUORIDE | CONVERSION | OXIDATION | AL2O3 | DEPOSITION | TRIMETHYLALUMINUM | SPECTRA | CCSD | ZNO

摘要：-grained quartz* grains (QG) recovered from a ~ 100-m* | , and oriented etch* pits are common in the QG* | is a high abundance of quartz* (Si), feldspar (Na* | Abstract An investigation on medium to coarse | drilled core section of the Sundarbans Forest site in

关键词： Microtexture | Quartz grain | SEM | Sundarbans forest site | SW Bangladesh | Surface features

摘要： situ quartz* crystal microbalance (QCM) studies were* | the diffusion-limited oxidation of Mo. The Mo etch | . Under saturation conditions, the Mo etch* rates were* | ) did not etch* Mo at 250 degrees C. Time-resolved QMS* | Thermal atomic layer etching (ALE) of

关键词： SELF-LIMITING FLUORINATION | HYDROGEN-FLUORIDE | COPPER | AL2O3 | TRIMETHYLALUMINUM | SN(ACAC)(2) | HFO2 | FILM | XPS

4008-161-200 800-990-8900

国家科技图书文献中心

摘要： theoretical model, we develop a CAD-like quartz crystal etch | © 2024This paper presents a quartz wet etching | formation of 2D etch profiles and optimize wafer etch | simulator that allows for simulations of various quartz | cut types and etch penetration. To validate the

关键词： Anisotropic etch | Etch penetration | MEMS | Quartz

摘要： this paper we will show the variety of Quartz etch | Quartz in combination with a tilt of the substrate. We | with a non-linear variation of etch depth throughout | Nano-imprint lithography (NIL) has proven to | be a powerful and cost-efficient technology for

关键词： Nano-imprint lithography | imprint master | quartz etch technologies | slanted waveguides | 3D patterns

摘要：. Mask quartz substrates are an ideal material for both | Quartz etches can generate 3D topographies in glass | -mixing gratings of different etch depths, meta-atoms | In recent years, new technologies in applied | optics and photonics have emerged, which go beyond the

关键词： EBeam | Quartz etch | Mask process | Nano-imprint | Augmented reality | Meta-lenses

摘要：Quartz is a widely used material in the field | indicators. Subsequently, the corresponding etch rate | acid in the BOE solution results in lower etch rate | of the etch rate, whereas the surface morphology | wet etching process of the z-cut α-quartz wafer

关键词： MEMS | Morphology | Quartz | Roughness | Wet etching

摘要： resistance is evaluated by the etch rate, surface roughness | resistance than the reference material, quartz. As the | amount of Y2O3 increased, the etch rate decreased, and | plasma resistance by an etch rate of 22.17 nm/min. | In this study, alumino-borate glass was

关键词： Plasma corrosion | Plasma resistance | Fluorocarbon plasma | Glass | YF2 | FLUORINE | Y2O3 | BEHAVIOR | AL2O3 | OXIDE

摘要：? 2024 Elsevier LtdDetrital quartz grains | its quartz grains. The aeolian facies sediments are | characterized by quartz grains with rounded outlines, upturned | quartz grains featuring subangular outlines, v-shaped | the quartz grains of the sebkhas suggest multiple

关键词： Microtextures | Quartz grain | Salt weathering | Sebkha | Sedimentary processes | Southeast Tunisia

摘要：) x etch products in the gas phase observed by in | intensities for the M(acac) x etch products during five | etch products resulting from the O-3 exposure. Sc2O3 | etch products with the same oxidation state as the | including V2O5, Mn2O3 , and Co3O4 displayed M(acac) x etch

关键词： 1,1,1,5,5,5-HEXAFLUORO-2,4-PENTANEDIONE H(+)HFAC | HYDROGEN-FLUORIDE | COPPER | OXIDATION | FLUORINATION | MECHANISM | AL2O3 | VAPOR | ZNO | TRIMETHYLALUMINUM

摘要： (PEt3) to yield a volatile gold etch product. Quartz | 175 degrees C. The most consistent etch rate was | yielded a volatile etch product. In situ quadrupole mass | -containing etch product during PEt3 exposures. Time | ab inito calculations support these etch product

关键词： SELF-LIMITING FLUORINATION | HYDROGEN-FLUORIDE | CONVERSION | OXIDATION | AL2O3 | DEPOSITION | TRIMETHYLALUMINUM | SPECTRA | CCSD | ZNO

摘要：-grained quartz grains (QG) recovered from a ~ 100-m | , and oriented etch pits are common in the QG | is a high abundance of quartz (Si), feldspar (Na | Abstract An investigation on medium to coarse | drilled core section of the Sundarbans Forest site in

关键词： Microtexture | Quartz grain | SEM | Sundarbans forest site | SW Bangladesh | Surface features

摘要： situ quartz crystal microbalance (QCM) studies were | the diffusion-limited oxidation of Mo. The Mo etch | . Under saturation conditions, the Mo etch rates were | ) did not etch Mo at 250 degrees C. Time-resolved QMS | Thermal atomic layer etching (ALE) of

关键词： SELF-LIMITING FLUORINATION | HYDROGEN-FLUORIDE | COPPER | AL2O3 | TRIMETHYLALUMINUM | SN(ACAC)(2) | HFO2 | FILM | XPS

4008-161-200 800-990-8900

国家科技图书文献中心

摘要： theoretical model, we develop a CAD-like quartz crystal etch | © 2024This paper presents a quartz* wet etching* | formation of 2D etch profiles and optimize wafer etch | simulator that allows for simulations of various quartz | cut types and etch* penetration. To validate the*

摘要： this paper we will show the variety of Quartz etch | Quartz in combination with a tilt of the substrate. We | with a non-linear variation of etch* depth throughout* | Nano-imprint lithography (NIL) has proven to | be a powerful and cost-efficient technology for

摘要：. Mask quartz* substrates are an ideal material for both* | Quartz etches can generate 3D topographies in glass | -mixing gratings of different etch* depths, meta-atoms* | In recent years, new technologies in applied | optics and photonics have emerged, which go beyond the

摘要：Quartz is a widely used material in the field | indicators. Subsequently, the corresponding etch* rate* | acid in the BOE solution results in lower etch* rate* | of the etch* rate, whereas the surface morphology* | wet etching process of the z-cut α-quartz* wafer*

摘要： resistance is evaluated by the etch* rate, surface roughness* | resistance than the reference material, quartz. As the | amount of Y2O3 increased, the etch* rate decreased, and* | plasma resistance by an etch* rate of 22.17 nm/min.* | In this study, alumino-borate glass was

摘要：? 2024 Elsevier LtdDetrital quartz* grains* | its quartz* grains. The aeolian facies sediments are* | characterized by quartz* grains with rounded outlines, upturned* | quartz grains featuring subangular outlines, v-shaped | the quartz* grains of the sebkhas suggest multiple*

摘要：) x etch* products in the gas phase observed by in* | intensities for the M(acac) x etch* products during five* | etch products resulting from the O-3 exposure. Sc2O3 | etch products with the same oxidation state as the | including V2O5, Mn2O3 , and Co3O4 displayed M(acac) x etch

摘要： (PEt3) to yield a volatile gold etch product. Quartz | 175 degrees C. The most consistent etch* rate was* | yielded a volatile etch* product. In situ quadrupole mass* | -containing etch* product during PEt3 exposures. Time* | ab inito calculations support these etch* product*

摘要：-grained quartz* grains (QG) recovered from a ~ 100-m* | , and oriented etch* pits are common in the QG* | is a high abundance of quartz* (Si), feldspar (Na* | Abstract An investigation on medium to coarse | drilled core section of the Sundarbans Forest site in

摘要： situ quartz* crystal microbalance (QCM) studies were* | the diffusion-limited oxidation of Mo. The Mo etch | . Under saturation conditions, the Mo etch* rates were* | ) did not etch* Mo at 250 degrees C. Time-resolved QMS* | Thermal atomic layer etching (ALE) of