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1. Oxidation anisotropy of 4H-SiC wafers during chemical-mechanical polishing NSTL国家科技图书文献中心
Wang, Wantang | Lu, Xuesong... - 《Materials science in semiconductor processing》 - 2025,185(Pt.1) - 共5页
2. Modeling of surface microtopography evolution in chemical mechanical polishing considering chemical-mechanical synergy NSTL国家科技图书文献中心
Yang, Ke | Huang, Ning... - 《Tribology International》 - 2025,201 - 共12页 - 被引量:1
3. Equilibrium between chemical and mechanical parameters for single-crystal SiC in Electro-Fenton chemical-mechanical polishing NSTL国家科技图书文献中心
Deng, Jiayun | Bai, Zilei... - 《Diamond and Related Materials》 - 2025,152 - 111979~ - 共10页
4. Effect of pretreatment of chemical mechanical polishing slurry on surface quality of Al_2O_3/TiO_2 nanolaminates NSTL国家科技图书文献中心
Xiaoju Men | Jinhui Yang... - 《Tenth Symposium on Novel Optoelectronic Detection Technology and Applications,Part Three of Three Parts》 - Symposium on Novel Optoelectronic Detection Technology and Applications - 2025, - 1351149.1~1351149.8 - 共8页
5. Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties NSTL国家科技图书文献中心
Wang, Zhenyang | Wang, Tongqing... - 《Electronic Materials Letters》 - 2025,21(2) - 252~259 - 共8页
6. Experimental study of chemical mechanical polishing of polycrystalline diamond based on photo-Fenton reaction NSTL国家科技图书文献中心
Luo, Ziyuan | Lu, Jiabin... - 《Materials science in semiconductor processing》 - 2025,186 - 共13页 - 被引量:1
7. Review on chemical mechanical polishing for atomic surfaces using advanced rare earth abrasives NSTL国家科技图书文献中心
Chen, Xiangyan | Zhang, Zhenyu... - 《Journal of Physics,D.Applied Physics》 - 2025,58(2) - 共33页
Xiaoxiao Zhu | Juxuan Ding... - 《Applied Surface Science》 - 2025,679(Jan.15) - 161157.1~161157.11 - 共11页
9. Efficient access to non-damaging GaN (0001) by inductively coupled plasma etching and chemical-mechanical polishing NSTL国家科技图书文献中心
Qiubo Li | Shouzhi Wang... - 《Applied Surface Science》 - 2025,679(Jan.15) - 161207.1~161207.8 - 共8页 - 被引量:1
10. Effect of 3-amino-1,2,4-triazole and triethylenetetramine on silicon backside thinning chemical mechanical polishing NSTL国家科技图书文献中心
Qiu, Yuxuan | Nie, Shenao... - 《Materials science in semiconductor processing》 - 2025,185(Pt.1) - 共14页
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